2161-H O’Toole Ave.

San Jose, CA 95131

The core of our materials development is our unique plasma enhanced chemical vapor deposition equipment. Conventional materials processed include:

-Silicon Oxide

-Silicon Nitride

-Amorphous Silicon

- Porous Silicon

Our molecular engineering permits the development of application specific materials such as:

- Selective wetting silicon nanocomposites

-Variable In Plane Index of Refraction nanocomposites with an ability to produce index of refraction from less than 1.5 to over 2.7 for photonic and optical applications

- Variable dielectric constant quantum dot nanocomposites

- Long term environmentally stable poled polymers for electro-optic applications

Applications addressed to date are:

- Rel Seal coating of silicon nitride to completed microelectronic assemblies to provide environmental robustness and reliability without hermetic packaging

- VIPIR and poled plasma polymers for optical chip to chip interconnect

- Monolithic integration of photonic and microelectronic devices. Various hjgh density photonic sensors are fabricated on completed CMOS devices for low noise signal processing

All information presented is the property of Ionic Systems. Any unauthorized use and/or reproduction is prohibited.Copyright © 2005 Ionic Systems. All rights reserved.