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Ionic Systems has clean room laboratory and fabrication in 2,000 square feet of Class 100 clean room. Ionic Systems proprietary systems for plasma enhanced vapor deposition in both large area format (760mm X 760mm) and high temperature single wafer development systems are available. Two Deep UV contact aligners are used for lithography. Metal deposition equipment for both thermal evaporation and sputtering are present. Substrate and mask cleaning equipment are available as well as wet benches for acid and solvent processing. Thin film optical properties are measured using Gaertner multiple wavelength, multiple angle ellipsometry, Metricon prism coupling analysis, and Nanometrics Nanospec. Mechanical properties are characterized through thin film stress measurements at ambient and elevated temperature. Elemental analysis can be performed in house using infrared and visible spectroscopy and X ray microprobe. Device testing is performed in house using our vibration isolated optical bench and complete testing equipment for electrical and optical characterization. Optical and electrical characterization of devices can be performed at up to 20GHz. Wafer and die probing are performed using in house wafer probers. Die preparation such as edge polishing and wire bonding can be performed in house. Environmental chambers for vacuum and elevated temperature storage are available as well as temperature and humidity cycling chambers.
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