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Ionic Systems was formed in 1979 to investigate and produce plasma enhanced chemical vapor deposition systems that deposit high quality materials at room temperature. Our company can be characterized as a developer of thin film materials and application processes enabled by our unique room temperature deposition and molecular engineering. Ionic Systems has successfully developed a line of analytical equipment for measuring film properties and demonstrated its thin film technology for over twenty five years. Ionic Systems has leveraged its preeminent position in room temperature deposition to materials development on a molecular level. Materials establish manufacturing processes that combine to enable structures and device designs. Ionic Systems is using is experience to molecularly engineer materials to form a bridge between technologies such as microelectronics, photonics, optics, and microelectical mechanical systems (MEMS). Our work centers on the development of thin film materials possessing properties that enable devices to be fabricated more cost effectively than conventional means, produce functionality that is not possible with conventional materials, or both. We are addressing applications from chip to chip optical interconnect to biological decontamination for commercial, aerospace, and military customers.
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